製程環境設備
化學汙染物設備
曝光機鏡組霧化防護機組(TAU-WS)
1. 防止曝光機鏡面霧化，延長使用年限
2. 延長曝光機lamp使用時間
3. 提升製程良率
4. 防止化學汙染物腐蝕機台內部元件
5. 延長製程設備的化學濾網壽命
2. 延長曝光機lamp使用時間
3. 提升製程良率
4. 防止化學汙染物腐蝕機台內部元件
5. 延長製程設備的化學濾網壽命
FUNCTIONS & BENEFITS
功能/效益
去除AMC的同時提供穩定的溫溼度控制
保持出風溫度±0.1℃/相對溼度0.5%
APPLICATION
應用場合
PRODUCT ADVANTAGES
產品優勢
01
Advantages
鏡面霧化延緩
Lens Hazing Delay
02
Advantages
裝機實績
Experience
260
260
台
03
Advantages
人機介面
HMI
PRODUCTS SPECIFICATIONS
產品規格
Specification |
Equipment Type | TAU-WS37 |
| Dimension(mm) | 1470Lx 800Dx 2625H | |
| Supply Air Volume (m3/min) | 37 | |
| Supply Air Volume (m3/hr) | 2220 | |
| Temperature Control Range&Accuracy(℃)*1 | 22℃~24℃, ±0.5℃ | |
| Humidity Control Range&Accuracy (RH%)*1 | 45~50%, ±5%RH | |
| Removal Efficiency | > 80-90% in Main AMC((NH3 , SO2, HCI, HF, PGME, PGMEA, NMP, DMSO, IPA…) | |
| Environment Temperature(℃)*1 | 22-24 | |
| Environment Humidity (RH%)*1 | 40-45% | |
| Dew point of environment(℃)*1 | 7.8 - 11.5 | |
| HMI | 7.0" Full Color Touch Panel | |
| Utility | Power Source | AC220V, 3Ø, 3Wire+PE, 50/60Hz |
| Maximum Power Consuming (kW) | 10 | |
| Cooling Water (PCW) | 18℃@Rp 3/4" (ISO 7/1) | |
| DI water | ≦18℃@Rp 3/4" (ISO 7/1) | |
| Drain piping | Rp 3/4" (ISO 7/1) | |
| Note | *1 Variable, Depend on Env. |
|
PRODUCT APPLICATIONS
產品應用
搭接設備
Lithography
客戶與實績
01
半導體封裝大廠
02
光電面板大廠
